Summary |
APE-LE |
APE-HE |
| Experiment |
High-resolution photoemission;
Fermi sruface and Fermi surface instabilities mapping |
Photoelectron spectro(micro)scopy;
Electronic spin investigation;
Magnetic microscopy |
| Undulator |
Apple II quasi-periodic
Period 125 mm |
Apple II periodic
Period 60 mm |
| Monochromator |
Plane grating |
Plane grating |
| Energy range |
10-100 eV |
140-1500 eV |
| Photon resolution E/DE |
~1.3X104 @ ~60 eV
~1.7X104 @ ~45 eV |
~104 @ ~400 eV
~3-5*103 @ ~900 eV |
| Experimental resolution |
6-8 meV |
- |
| Polarization |
Variable (linear -- horizontal and vertical, circular)
|
Variable (linear -- horizontal and vertical, circular) |
| Higher order light contribution |
< 1% |
- |
| Spot size |
50 X 100 µm |
80-200 nm (with Fresnel zone-plate) or
25 X 100 µm (with toroidal refocusing mirror) |
| End station equipment |
Scienta SES-2002 analyzer;
Cryostat T<17 K;
Automatized manipulator for complete Fermi surface mapping;
LEED;
Sputter gun;
Evaporators |
Zone-plate focusing optics;
Omicron 125 mm hemispherical analyzer;
70 KV Mott detector(s) |
| Preparation chambers |
Standard preparation techniques (ion-sputtering,
annealing, cleaving, e-beam evaporation);
LEED and Auger characterization;
Kerr-effect measurements;
Atomic resolution STM (room temperature)
|