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360° panorama small - big
Optical Lithography:
Karl Suss MJB3 mask aligner 4" wafer - 1mm features routinely achieved.
Metal deposition:
RIAL EGE 450 electron beam evaporator ohmic contacts and deposition of metal layers on nanometric scale.
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and here to switch on the plasma
Dielectric films deposition
SISTEC CVD 600 T The system is set up to grow SiO2, Si3N4 and stress controlled SiOxNy Rf power 500W gas available SiH4; NH3, N2O, N2 O2
AFM and AFM lithography
Veeco-Thermomicroscope Autoprobe CP research scan size 100mm, lithography software.
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